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Datasheets / Brochures
- Datasheet Source-Mask Optimzation (pdf - 200kb)
- Datasheet MO Exposure Optics (pdf - 200kb)
Presentations
- Innovative Mask Aligner Lithography for MEMS and Packaging - Semicon Taiwan 2010(pdf - 1900kb)
- Presentation MO Exposure Optics & Source-Mask Optimization (pdf - 1400kb)
Papers& Publications
- Advanced mask aligner lithography: new illumination system - Optics Express 2010, Vol 18, N° 20 (pdf - 1500kb)
- Half-tone proximity lithography - Proc. SPIE 7716 2010 (pdf - 1750kb)
- Optimization of illumination pupils and mask structures for proximity printing - Microelectron. Eng. (2009), doi:10.1016/j.mee.2009.10.038 (pdf - 530kb)
- Contact and proximity lithography using 193nm Excimer Laser in Mask Aligner - MNE, Vol 87, 936-939, ISSN 0167-9317 2010 (pdf - 330kb)
- Special on MO Exposure Optics - SUSS Report 2009 (pdf - 725kb)
