you are here:
Skip over navigation
Contact
Shop
About us
General Overview
News
Contact
SUSS MicroOptics
SUSS MicroTec
Source-Mask Optimization
Source-Mask Optimization
Definition
Features
Stabilize Source: MO Exposure Optics
Optimize Source: Illumination Filter Plates
Optimize Masks: Optical Proximity Correction
Customized Solutions
Weblog
downloads
print
«
back
Optimize Masks: Optical Proximity Correction
At a glance
Precompensate print errors like corner rounding and line edge shortening on mask using optical proximity correction (OPC)
Combine
customized iIlumination
(IFP) and OPC
Mask Optimization
Results from OPC simulation
click to enlarge