At a glance

• Stabilize Source: MO Exposure Optics
• Improved exposure light uniformity and lamp stability
• Telecentric illumination and uniform angular spectrum of illumination light until the edge of the wafer
• Optimize Source: Customized Illumination
• Switch illumination from contact to proximity in less than a minute
• Shape illumination to reduce diffraction effects at mask pattern
• Library of Illumination Filter Plates (IFP)
• Optimize Masks: Optical Proximity Correction
• Precompensate print errors like corner rounding and line edge shortening on mask using Optical Proximity Correction (OPC)
• Combine Customized Illumination (IFP) and OPC